期刊详情
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JOURNAL DETAIL
Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing

EI
ISSN:0272-4324
e-ISSN:1572-8986

详情

出版商:
Springer
国家:
United States
学科1:
Chemical Engineering (all)
学科2:
Chemistry (all)
学科3:
Surfaces, Coatings and Films
学科4:
Condensed Matter Physics
学科5:
-
学科6:
-
学科7:
-
学科8:
-
OA:
NO
是否在库:
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